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1

Two-dimensional modeling of high plasma density inductively coupled sources for materials processing

Ventzek, Peter L. G.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1994

Language:

english

File:

PDF, 1.70 MB

english, 1994

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advanced Etch Technology for Nanopatterning IV - Electron energy distribution control by fiat: breaking from the conventional flux ratio scaling rules in etch

Lin, Qinghuang, Engelmann, Sebastian U., Zhang, Ying, Ranjan, Alok, Wang, Mingmei, Sherpa, Sonam, Ventzek, Peter

Year:

2015

Language:

english

File:

PDF, 665 KB

english, 2015

3

Implementation of atomic layer etching of silicon: Scaling parameters, feasibility, and profile control

Ranjan, Alok, Wang, Mingmei, Sherpa, Sonam D., Rastogi, Vinayak, Koshiishi, Akira, Ventzek, Peter L. G.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2016

Language:

english

File:

PDF, 2.99 MB

english, 2016

4

Quasiatomic layer etching of silicon oxide selective to silicon nitride in topographic structures using fluorocarbon plasmas

Wang, Mingmei, Ventzek, Peter L. G., Ranjan, Alok

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2017

Language:

english

File:

PDF, 3.61 MB

english, 2017

5

Quasiatomic layer etching of silicon nitride with independent control of directionality and selectivity

Sherpa, Sonam D., Ventzek, Peter L. G., Ranjan, Alok

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2017

Language:

english

File:

PDF, 1.56 MB

english, 2017

6

New insight into desorption step by Ar + ion-bombardment during the atomic layer etching of silicon

Sherpa, Sonam D., Ventzek, Peter L. G., Lee, Myungsuk, Hwang, Gyeong S., Ranjan, Alok

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2018

Language:

english

File:

PDF, 2.09 MB

english, 2018

7

Etch considerations for directed self-assembly patterning using capacitively coupled plasma

Rastogi, Vinayak, Ventzek, Peter L. G., Ranjan, Alok

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2018

Language:

english

File:

PDF, 2.82 MB

english, 2018

8

Density Functional Theory Study of Oxygen Adsorption on Polymer Surfaces for Atomic Layer Etching: Implications for Semiconductor Device Fabrication

Longo, Roberto C., Ranjan, Alok, Ventzek, Peter L. G.

Journal:

ACS Applied Nano Materials

Year:

2020

File:

PDF, 15.86 MB

2020

9

Electron–phonon dynamics in metals on ultrashort timescales

Oliver B Wright, Peter L.G Ventzek, Vitalyi E Gusev

Journal:

Physica B: Condensed Matter

Year:

1999

Language:

english

File:

PDF, 91 KB

english, 1999

10

Dynamics of excimer laser‐ablated aluminum neutral atom plume measured by dye laser resonance absorption photography

Gilgenbach, Ronald M., Ventzek, Peter L. G.

Journal:

Applied Physics Letters

Year:

1991

Language:

english

File:

PDF, 655 KB

english, 1991

11

Two-dimensional hybrid model of inductively coupled plasma sources for etching

Ventzek, Peter L. G., Sommerer, Timothy J., Hoekstra, Robert J., Kushner, Mark J.

Journal:

Applied Physics Letters

Year:

1993

Language:

english

File:

PDF, 611 KB

english, 1993

12

Computational modeling study of the radial line slot antenna microwave plasma source with comparisons to experiments

Raja, Laxminarayan L., Mahadevan, Shankar, Ventzek, Peter L. G., Yoshikawa, Jun

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2013

Language:

english

File:

PDF, 2.82 MB

english, 2013

13

A Method for Identifying Sources of Reactive Ion Etch Lag and Loading in a Magnetically Enhanced Reactive Ion Etcher

Buie, Melisa J., Pender, Jeremiah T. P., Ventzek, Peter L. G.

Journal:

Japanese Journal of Applied Physics

Year:

1997

File:

PDF, 1.75 MB

1997

14

Schlieren measurements of the hydrodynamics of excimer laser ablation of polymers in atmospheric pressure gas

Ventzek, Peter L. G., Gilgenbach, Ronald M., Sell, Jeffrey A., Heffelfinger, David M.

Journal:

Journal of Applied Physics

Year:

1990

Language:

english

File:

PDF, 638 KB

english, 1990

15

Charged species dynamics in an inductively coupled Ar/SF[sub 6] plasma discharge

Rauf, Shahid, Ventzek, Peter L. G., Abraham, Ion C., Hebner, Gregory A., Woodworth, Joseph R.

Journal:

Journal of Applied Physics

Year:

2002

Language:

english

File:

PDF, 381 KB

english, 2002

16

Monte Carlo simulation study of the scaling of electron transport parameters in crossed dc electric and magnetic fields

Nakamura, Satoru, Ventzek, Peter L. G., Kitamori, Kazutaka

Journal:

Journal of Applied Physics

Year:

1999

Language:

english

File:

PDF, 377 KB

english, 1999

17

Conformal doping of topographic silicon structures using a radial line slot antenna plasma source

Ueda, Hirokazu, Ventzek, Peter L. G., Oka, Masahiro, Horigome, Masahiro, Kobayashi, Yuuki, Sugimoto, Yasuhiro, Nozawa, Toshihisa, Kawakami, Satoru

Journal:

Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 2.99 MB

english, 2014

18

Photoacoustic and photothermal beam deflection as a probe of laser ablation of materials

Sell, Jeffrey A., Heffelfinger, David M., Ventzek, Peter L. G., Gilgenbach, Ronald M.

Journal:

Journal of Applied Physics

Year:

1991

Language:

english

File:

PDF, 940 KB

english, 1991

19

Higher-order sampling strategies in Monte Carlo simulations of electron energy distribution functions in plasmas

Ventzek, Peter L. G., Kitamori, Kazutaka

Journal:

Journal of Applied Physics

Year:

1994

Language:

english

File:

PDF, 675 KB

english, 1994

20

Ionized physical vapor deposition of Cu using a mixture of rare gases

Rauf, Shahid, Ventzek, Peter L. G.

Journal:

Journal of Applied Physics

Year:

2001

Language:

english

File:

PDF, 293 KB

english, 2001

21

Model for an inductively coupled Ar/c-C[sub 4]F[sub 8] plasma discharge

Rauf, Shahid, Ventzek, Peter L. G.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2002

Language:

english

File:

PDF, 427 KB

english, 2002

22

Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two-dimensional modeling

Ventzek, Peter L. G.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1994

Language:

english

File:

PDF, 2.40 MB

english, 1994

23

Low target power wafer sputtering regime identified during magnetron tantalum barrier physical vapor deposition

Stout, Phillip J., Denning, Dean J., Michaelson, Lynne M., Bagchi, Sandeep, Zhang, Da, Ventzek, Peter L. G.

Journal:

Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 706 KB

english, 2005

24

A two‐dimensional model of laser ablation of frozen Cl2: A possible neutral beam source for etching applications

Ventzek, Peter L. G., Suzuki, Motoyuki, Date, H., Sakai, Y., Tagashira, H., Kitamori, K.

Journal:

Journal of Applied Physics

Year:

1996

Language:

english

File:

PDF, 502 KB

english, 1996

25

Model for nitridation of nanoscale SiO[sub 2] thin films in pulsed inductively coupled N[sub 2] plasma

Rauf, Shahid, Lim, Sangwoo, Ventzek, Peter L. G.

Journal:

Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 675 KB

english, 2005

26

Simulations of step responses of electronegative radio-frequency capacitively coupled discharges

Yang, Jing, Ventzek, Peter L. G., Sakai, Y., Date, H., Kitamori, K., Tagashira, H., Meyyappan, M.

Journal:

Journal of Applied Physics

Year:

1998

Language:

english

File:

PDF, 558 KB

english, 1998

27

Plasma and process characterization of high power magnetron physical vapor deposition with integrated plasma equipment—feature profile model

Zhang, Da, Stout, Phillip J., Ventzek, Peter L. G.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2003

Language:

english

File:

PDF, 395 KB

english, 2003

28

Ionized physical vapor deposition of Cu on 300 mm wafers: A modeling study

Rauf, Shahid, Ventzek, Peter L. G., Arunachalam, Valli

Journal:

Journal of Applied Physics

Year:

2001

Language:

english

File:

PDF, 414 KB

english, 2001

29

Schlieren and dye laser resonance absorption photographic investigations of KrF excimer laser-ablated atoms and molecules from polyimide, polyethyleneterephthalate, and aluminum

Ventzek, Peter L. G., Gilgenbach, Ronald M., Ching, Chi Hong, Lindley, Roger A.

Journal:

Journal of Applied Physics

Year:

1992

Language:

english

File:

PDF, 1.89 MB

english, 1992

30

Impact of static magnetic fields on the radial line slot antenna plasma source

Yoshikawa, Jun, Ventzek, Peter L. G.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2013

Language:

english

File:

PDF, 1.80 MB

english, 2013

31

Modeling high power magnetron copper seed deposition: Effect of feature geometry on coverage

Stout, Phillip J., Zhang, Da, Ventzek, Peter L. G.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2003

Language:

english

File:

PDF, 798 KB

english, 2003

32

Step responses of radio-frequency capacitively coupled discharges

Yang, Jing, Ventzek, Peter L. G., Sugawara, H., Sakai, Y., Kitamori, K., Tagashira, H.

Journal:

Journal of Applied Physics

Year:

1997

Language:

english

File:

PDF, 538 KB

english, 1997

33

Laser beam deflection as a probe of laser ablation of materials

Sell, Jeffrey A., Heffelfinger, David M., Ventzek, Peter, Gilgenbach, Ronald M.

Journal:

Applied Physics Letters

Year:

1989

Language:

english

File:

PDF, 621 KB

english, 1989

34

Relationship between center-peaked plasma density profiles and harmonic electromagnetic waves in very high frequency capacitively coupled plasma reactors

Sawada, Ikuo, Ventzek, Peter L. G., Lane, Barton, Ohshita, Tatsuro, Upadhyay, Rochan R., Raja, Laxminarayan L.

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 313 KB

english, 2014

35

Measurements and modeling of the impact of weak magnetic fields on the plasma properties of a planar slot antenna driven plasma source

Yoshikawa, Jun, Susa, Yoshio, Ventzek, Peter L. G.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2015

Language:

english

File:

PDF, 1.51 MB

english, 2015

36

Guest Editorial Special Issue on Advances on Plasma Processing for Semiconductor Manufacturing

Shannon, Steven, Kinder, Ron, Paterson, Alex, Rauf, Shahid, Ventzek, Peter L. G.

Journal:

IEEE Transactions on Plasma Science

Year:

2009

Language:

english

File:

PDF, 140 KB

english, 2009

37

Mechanisms for dose retention in conformal arsenic doping using a radial line slot antenna microwave plasma source

Ueda, Hirokazu, Ventzek, Peter L. G., Oka, Masahiro, Kobayashi, Yuuki, Sugimoto, Yasuhiro

Journal:

Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 2.32 MB

english, 2015

38

Formation, nature, and stability of the arsenic-silicon-oxygen alloy for plasma doping of non-planar silicon structures

Ventzek, Peter L. G., Kweon, Kyoung E., Ueda, Hirokazu, Oka, Masahiro, Sugimoto, Yasuhiro, Hwang, Gyeong S.

Journal:

Applied Physics Letters

Year:

2014

Language:

english

File:

PDF, 1.27 MB

english, 2014

39

Gate etch process model for static random access memory bit cell and FinFET construction

P. J. Stout, S. Rauf, R. D. Peters, P. L. G. Ventzek

Year:

2006

Language:

english

File:

PDF, 1.30 MB

english, 2006

40

Structure of the velocity distribution of sheath-accelerated secondary electrons in an asymmetric RF-dc discharge

Khrabrov, Alexander V, Kaganovich, Igor D, Ventzek, Peter L G, Ranjan, Alok, Chen, Lee

Journal:

Plasma Sources Science and Technology

Year:

2015

Language:

english

File:

PDF, 3.51 MB

english, 2015

41

Plasma Chemistry of Octafluorocyclopentene/Argon/Oxygen Mixtures

Kang, Song-Yun, Sawada, Ikuo, Kondo, Yasuko, Ventzek, Peter L. G.

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 387 KB

english, 2008

42

SPIE Proceedings [SPIE OE/LASE'93: Optics, Electro-Optics, & Laser Applications in Science& Engineering - Los Angeles, CA (Sunday 17 January 1993)] Laser Radiation Photophysics - Species-resolved laser-probing investigations of the hydrodynamics of KrF excimer and copper vapor laser ablation processing of materials

Ventzek, Peter L. G., Gilgenbach, Ronald M., Ching, Chi H., Lindley, R. A., Braren, Bodil, Libenson, Mikhail N.

Year:

1993

Language:

english

File:

PDF, 414 KB

english, 1993

43

Measurement of spatial and temporal evolution of electromagnetic fields in a 100 MHz plasma source using B dot and double dipole probes

Lane, Barton, Campbell, Colin, Sawada, Ikuo, Ventzek, Peter L. G.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2016

Language:

english

File:

PDF, 2.27 MB

english, 2016

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advanced Etch Technology for Nanopatterning VI - Guiding gate-etch process development using 3D surface reaction modeling for 7nm and beyond

Engelmann, Sebastian U., Wise, Rich S., Dunn, Derren, Sporre, John R., Deshpande, Vaibhav, Oulmane, Mohamed, Gull, Ronald, Ventzek, Peter, Ranjan, Alok

Year:

2017

Language:

english

File:

PDF, 655 KB

english, 2017

45

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Global minimization line-edge roughness analysis of top down SEM images

Sanchez, Martha I., Ukraintsev, Vladimir A., Lane, Barton, Mack, Chris, Eibagi, Nasim, Ventzek, Peter

Year:

2017

Language:

english

File:

PDF, 822 KB

english, 2017

46

Microwave plasma doping: Arsenic activation and transport in germanium and silicon

Miyoshi, Hidenori, Oka, Masahiro, Ueda, Hirokazu, Ventzek, Peter L. G., Sugimoto, Yasuhiro, Kobayashi, Yuuki, Nakamura, Genji, Hirota, Yoshihiro, Kaitsuka, Takanobu, Kawakami, Satoru

Journal:

Japanese Journal of Applied Physics

Year:

2016

Language:

english

File:

PDF, 1.15 MB

english, 2016

47

Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition

Iwao, Toshihiko, Ventzek, Peter L. G., Upadhyay, Rochan, Raja, Laxminarayan L., Ueda, Hirokazu, Ishibashi, Kiyotaka

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2018

Language:

english

File:

PDF, 1.75 MB

english, 2018

48

Recent advances in the modeling and computer simulations of non-equilibrium plasma discharges

Raja, Laxminarayan L, Bourdon, Anne, Ventzek, Peter L G

Journal:

Journal of Physics D Applied Physics

Year:

2018

Language:

english

File:

PDF, 235 KB

english, 2018

49

Theoretical evaluation of thermal decomposition of dichlorosilane for plasma-enhanced atomic layer deposition of silicon nitride: the important role of surface hydrogen

Hartmann, Gregory, Ventzek, Peter L. G., Iwao, Toshihiko, Ishibashi, Kiyotaka, Hwang, Gyeong S.

Journal:

Physical Chemistry Chemical Physics

Year:

2018

Language:

english

File:

PDF, 2.99 MB

english, 2018

50

Factors influencing ion energy distributions in pulsed inductively coupled argon plasma

Chen, Zhiying, Longo, Roberto, Hummel, Michael, Carruth, Megan, Blakeney, Joel, Ventzek, Peter, Ranjan, Alok

Journal:

Journal of Physics D Applied Physics

Year:

2020

File:

PDF, 871 KB

2020

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